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Products and Services arrow Products and Services arrow AUTOMATIC EXPOSURE MACHINE & SUPERGAUGE arrow ADTEC Full Automatic Exposure System arrow ADTEC Step & Repeat Projection Exposure System (ADEX4000P/S)
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AUTOMATIC EXPOSURE MACHINE & SUPERGAUGE arrow ADTEC Full Automatic Exposure System arrow ADTEC Step & Repeat Projection Exposure System (ADEX4000P/S)



ADTEC Step & Repeat Projection Exposure System (ADEX4000P/S)


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ADTEC Step & Repeat Projection Exposure System (ADEX4000P/S) 

 

This projection-type automatic exposure machine for printed circuit boards features a step and repeat system. A wide surface area can be covered by a single exposure due to the fact that the machine is equipped with a magnified-projection lens.

 

The TTL-system alignment ensures the high-accuracy positioning of mask mark on fiducial marks. The independent vertical and horizontal variable exposure magnification function offers improved overlay accuracy across the entire surface. 

  

 

 

 

apex4000ps 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

Features
 

2x magnified projection system

·        An exposure area of 200x250mm has been realized

·        The mask size can be reduced to 6x6 inches (152x152mm) enabling the reduction of mask costs and mask storage space.

An optical system with high resolution projection

·        The accuracy of lens processing, variations in lens installation method, and other factor were closely examined from the design stage to minimize the amount of distortion and to achieve a high and uniform resolution across the entire surface.

 

Long focus depth

·        Focal depth of ±100µm (ADEX4000P) and ±75µm (ADEX4000S) enable the processing of warped and distorted substrate in addition to substrate with irregular surfaces

 

High accuracy alignment stage

·        The high-accuracy linear motor equipped with a laser interferometer realize high resolution, high accuracy substrate positioning.

 

Reticle changer

·        The reticle (mask) changer automatically changes the reticle.





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